CEE 6560
Last Updated
- Schedule of Classes - June 16, 2025 11:41AM EDT
- Course Catalog - September 10, 2024 9:48AM EDT
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CEE 6560
Course Description
Course information provided by the 2024-2025 Catalog. Courses of Study 2024-2025 is scheduled to publish mid-June.
This course focuses on the theoretical and engineering aspects of physical and chemical phenomena and processes applicable to the removal of impurities from water, wastewater, and industrial wastes. The first unit covers general chemical engineering principles relevant in environmental processes including mass balances, reactor models, and reaction kinetics. The second unit covers chemical processes involving dissolved species including gas transfer, adsorption, and oxidation-reduction processes. The third unit covers particle processes and the conventional theories behind particle destabilization, particle flocculation, and particle removal processes. Each topic area has a corresponding problem set that provides students with opportunities to apply the fundamentals discussed in class. The fundamental theory is coupled with a number of real-world examples that provide context for the more abstract principles that are introduced.
Prerequisites/Corequisites Prerequisite: CEE 3510 for undergraduates or permission of instructor.
Last 4 Terms Offered (None)
Outcomes
- Recognize critical water quality regulations.
- Recognize the advantages/disadvantages of conventional and advanced options for removal of dissolved and particulate contaminants.
- Formulate a qualitative understanding of the fundamental theory upon which individual treatment process design is based.
- Master the quantitative skills necessary to model and design individual processes and integrated wastewater and drinking water treatment systems.
When Offered Fall.
Regular Academic Session. Combined with: CEE 4555
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Credits and Grading Basis
3 Credits Graded(Letter grades only)
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Class Number & Section Details
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Meeting Pattern
- MWF Hollister Hall 312
- Aug 26 - Dec 9, 2024
Instructors
Helbling, D
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Additional Information
Instruction Mode: In Person
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